Biography: Wang Dawei, Expert of Shenzhen Standard Expert Database, Chairman of Shenzhen Micro-nano Manufacturing Industry Promotion Association, Chairman of Blue Uni (Shenzhen) Technology Development Co., Ltd. Focused on micro-nano manufacturing and next-generation information technology, it provides technology strategy consulting services to enterprises with construction of technology assets at its core. It’s dedicated to providing open platform for exchange and cooperation and building an international technology ecology by conducting specialized research of technology industrialization, so as to facilitate the industrialization process of enterprises with materials/processes/equipment common technology .

Abstract: TBD

 Biography: He received his Ph.D. in Chemistry from Peking University in 2006 and Ph.D. in Physics from Lund University, Sweden in 2009. As one of the earliest scientific researchers engaged in nanoimprint technology research in China, he began the scientific research on this technology as early as in 2001 during his graduate studies at Peking University, and then went to Sweden to further study nanoimprinting technology and began to participate in the research and development of industrialization projects. After his graduation, he joined Obducat as a nanoimprint expert, and successively served as the technical leader of SMASH and ANIP and other EU projects, as well as the technical leader of many industrialization projects such as LED substrate PSS (sapphire patterned substrate), panel-level aluminum wire grid WGP, AR/VR optical components and so on.

Biography: Andrea Kneidinger is Business Development Manager at EV Group, where she focuses on Micro- and Nanoimprint Lithography for a variety of applications, in particular nanophotonics and wafer level optics.Andrea received the master´s degree (M.Eng) from the Deggendorf Institute of Technology and Budapest University of Technology and Economics where she studied "Technology and Innovation Management". She has several years of professional experience in electrical engineering as well as product management -  especially in materials, optics and photonics.

Abstract: Wafer-level nanoimprint lithography (NIL) has increasingly become a key enabling technology supporting new devices and applications across the photonic industry. Leading manufacturers of optical sensors, augmented reality (AR) devices and biomedical chips are already utilizing NIL and realizing the benefits of this technology, including the ability to cost-effectively mass manufacture micro- and nano-scale structures.

Biography: Ge Haixiong received his Ph.D. in polymer chemistry and physics from the School of Chemistry and Chemical Engineering, Nanjing University in 1999, and was a postdoctoral fellow at the Shanghai Institute of Organic Chemistry from November 1999 to December 2000. From 2001 to 2003, he was a postdoctoral fellow in the Department of Electrical （电气） Engineering, Princeton University. From January to October 2005, he was a visiting scholar in the Department of Mechanical and Aerospace Engineering, University of California, Los Angeles. Since January 2004, he has been Associate Professor and Professor in the Department of Materials Science and Engineering, School of Modern Engineering and Application, Nanjing University. Mainly engaged in the research of micro-nano processing and nanoimprint technologies, he has explored several types of new nanoimprint materials, developed  imprint template of polymer composites and nanoimprint technology on curved surfaces; and the dual-purpose nanoimprinting equipment with ultraviolet light curing and hot pressing developed by him has been adopted by many scientific research institutions and production enterprises at home and abroad. He has published over 40 papers in international academic journals such as Nano Lett., Adv. Func. Mater., Appl. Phys. Lett., etc., and has more than 10 domestic and international invention patents.

Abstract: In this talk, we will first present a hybrid nanoimprint-soft lithography (HNSL). The key component of this technology is the mold, which consisted of an ultrathin rigid cross-linked patterning layer fused on an elastic support. It combines the advantages of a high-resolution nanoimprint mold with sub-10 nm feature size and a conformal soft lithography stamp with little imprint pressure. HNSL can be used to pattern nanostructures on both planar and non-planar substrates.Conventional resist coating methods are extremely challenging to form a uniform resist layer on irregular and/or non-planar substrates. To address this issue, a double transfer UV-curing nanoimprint (DTUCN) lithography, an improved version of HNSL, is developed. Our method utilizes two resist transfer steps; the resist is first transferred from a pre-spin-coated silicon carrying wafer to the HNSL mold, and then transferred from the mold to the surface to be imprinted.Here, we present several examples of nanopatterns and devices fabricated by HNSL, such as high refractive index slanted nanogratings, high aspect ratio aluminum nanowire grids, non-iridescent metal nanomesh with disordered nanoapertures, shape-controlled and monodisperse nanoparticles and T‑shape nanopillars, which can be applied in various fields.

Biography: In 2013, he graduated from the Academy of Opto-Electronics (AOE), Chinese Academy of Sciences with a master’s degree, focusing on micro-nano optoelectronic technology. He has successively worked in the Suzhou Institute of Nano-tech and Nano-bionics (SINANO), Chinese Academy of Sciences, and the Institute of Superlubricity Technology, Research Institute of Tsinghua University in Shenzhen. Engaged in the new micro-nano structures preparation technology for more than ten years, he’s been leading the development of high-resolution lithography process for abnormal undulating surfaces, precision splicing technology of nanoimprint molds and high-performance 3D projection display screens; As a main participant, he completed multiple government sponsored and non-government sponsored projects (纵向横向项目) such as transparent conductive film and large-area anti-glare diffusion film, etc.; During his long engagement in nanoimprint mold development and product preparation, he has applied for 6 patents and 1 PCT patent.

Biography:Feng Luo, Chair Professor, School of Materials Science and Engineering/School of Electronic Information and Optical Engineering, Nankai University Since 2021.Feng is currently a chair professor of School of materials science and engineering of Nankai University and an adjunct chair professor of Xi’an Jiaotong University from 2018-2020. From 1995 to 2004, he studied at the school of chemistry and molecular engineering, Peking University, and received his bachelor’s and doctor’s degrees. From 2004 to 2009, he worked in Germany and Switzerland as a postdoctor, and from 2009 to 2010, he served as a Principle Investigator in the Collge of Engineering of Peking University. From 2010 to 2020, he worked in the IMDEA Nanoscience as a senior research Professor. He has been selected as a Marie Curie scholar of the European Union, the Spanish fund for Distinguished Young scholars, the Spanish I3 distinguished professor, etc. At present, he serves as a board member of the science and innovation commission of the Institute of Advanced Science Facilities，Shenzhen, the member of Shanghai Light Source User Committee.

Abstract: A brief review over nanoimprinting technologies focused on micro/nano fabrication and ultra-precision manufacturing designed for semiconductor fieldhas been descried for patterning devices.

Biography: Chen Linsen is Research Fellow at Soochow University and Chairman of Board of Directors of SVG Tech Group. He’s also a leading expert of key projects of National 863 Program and major state-level scientific instrumentation special projects, valid candidate of Academician of the Chinese Academy of Engineering (CAE) (2013). He’s mainly focused on the research of micronano optics and its innovative applications.

Abstract: The presentation introduces the prospect research, innovation and application of micro-nano intelligent manufacturing.The photonics, optics and display industry have been developed rapidly in past decade of the century. There are great demands on micro/nano manufacturing which is the fundamental path to promote the innovation of the metaverse, planar imaging and flexible meta-material industries.The essential issue of micro/nano intelligent manufacturing is the digitization of light field, patterning, and replication capabilities. After years of efforts, our team has established a Micro/nano Intelligent Manufacturing Platform(MNIMP) on the large-format substrates. The bottleneck of real-time processing algorithm for massive data of 100Tb, digital patterning   and flexible micro/nano-replication with smart-identification has been broken through based on the  digital UV 3D lithographic equipment with network computing system and roll-to-roll multi-layer-alignment nanoimprinting lithography equipment. The MNMIP enables the further innovation of glasses-free 3D display, augmented reality(AR), planar imaging devices and flexible metamaterials, and is becoming a powerful engine for optoelectronics, light-field computation imaging, and the metaverse.

 Biography: Majored in Business Law, Patrik Lundstrom graduated from Business Administration in 1992. He’s joined Obducat Group in 2010 as CEO.

Abstract: TBD

Biography: Ma Jiang is Distinguished Professor of Shenzhen University, Director of the Research Center for Advanced Manufacturing and Application of New Metal Materials, Shenzhen University and  winner of the National Excellent Youth Fund. His main research direction is the advanced manufacturing and application of amorphous alloys. He has published more than 60 academic sci papers in international journals such as Science Advances and participated in writing two English monographs. He has been invited to make special / verbal presentations at various international conferences in the field of amorphous alloys. He has presided over multiple national natural science foundation research projects and others at the provincial and municipal levels. He’s assumed office as Deputy Secretary-General of the Amorphous Alloy Materials Branch of China Electrical Equipment Industry Association. He has won many honors such as the Outstanding Young Scientist Award of China Amorphous and High Entropy Alloy, Shenzhen Overseas High-level Talent, Shenzhen Excellent Teacher, and Shenzhen University "Liyuan Youqing", etc.

Abstract: Metallic glass with advantages of high strength, high precision, high surface finish and easy machining and forming. Through the precise controllable temperature rise system and rapid cooling system, the micro-nano precision thermal coupling molding of different materials can be realized under the ultra-high vacuum and high temperature environment.The research results mainly include:1. New amorphous alloy micro-nano manufacturing and molding equipment, The equipment has the advantages of high efficiency and good stability, which can greatly improve the thermoplastic forming efficiency and forming accuracy of amorphous alloy. 2. Thermal coupling manufacturing technology of amorphous alloys, The technology includes the selection and design of the material system, the precise control of the process parameters and the radial limit technology, which can effectively avoid the influence of the adverse phenomena such as crystallization and oxidation of amorphous alloy at high temperature.

Biography: Professor Cheng Xin graduated from the Department of Earth and Space Sciences, University of Science and Technology of China in 1997, received his master’s degree in Geochemistry from Stanford University in 1999, and received a Ph.D. in Electrical Engineering from the University of Michigan in 2005. From February to December 2005, he conducted postdoctoral research at Purdue University. From January 2006 to August 2012, he was an assistant professor in the Department of Electrical and Computer Engineering at Texas A&M University, and a tenured associate professor from September to December 2012. Since January 2013, he has worked full-time at SUSTech, serving as Professor and Head of the Department of Materials Science and Engineering, and concurrently holding the position as Head of SUSTech Center for Analysis and Testing.

Abstract: Due to its high resolution and low cost, nanoimprint has received widespread attention in many areas such as semiconductor manufacturing, flat panel display, and biochips. Different application scenarios put forward different technical requirements for nanoimprint. Although nanoimprint has been used in industry, a series of technical challenges still need to be solved to expand its application scenarios and market scope. This report focuses on basic technical issues such as surface engineering, polymer material mechanics, and interfacial interactions in the process of nanoimprinting, and analyzes and elaborates on the basic scientific and technical issues that need to be paid attention to in the future development of nanoimprinting.

Biography: Tao LI, Professor of Nanjing University (NJU). He was selected as the "Dengfeng Talent Program B" from NJU, won the "National Funds for Outstanding Young Scientists", "Young and middle-aged leading scientists" from MOST, and “K.C. Wong Education Foundation” scholarship. His research interest is about the micro/nano-photonics metamaterials, and photonic integration. Till now, he has published >100 papers with citation over 6000, presented >50 invited talks in international conferences and seminars. Now, he is working for Editorial Board of the Chinese Optics Letters, Science Bulletin, Advanced Devices & Instrumentation, etc.  

Abstract: In recent twenty years, the development of nanofabrication brings the optics Science and technology into the nanoscale, which opens new advances and disruptive techniques in optics. Micro/nano-photonics emerges, among which optical metamaterial is one of the most promising directions. This talk will start from the most active topic of metasurface, as one branch of metamaterials, introduce the working principle, discuss the state-of-art of the metalenses and the challenges they face. Particularly, aiming to solve the long-standing difficulties in the imaging technologies like the chromatic aberration, small field-of-view (FOV), compact integration, etc., we propose a series of solutions based on the metalens technique, and prospect its application scenarios.

Biography: Stella W. Pang is a Chair Professor and the Director of the Center for Biosystems, Neuroscience, and Nanotechnology of the Department of Electrical Engineering, City University of Hong Kong, China. She has over 400 technical articles, book chapters, and invited presentations. She has ten patents granted in nanotechnology and microsystems and four pending. Her research interests include nanofabrication technology for biomedical, microelectromechanical, THz and metadevices. Prof. Pang is a Fellow of IEEE, ECS, AVS, and HKIE. 

Abstract: Various designs of nanostructures have been applied for high-performance biosensors and metadevices. To generate these nanostructures and the rest of the device components, fast, uniform, and reproducible nanotechnology will be needed. We have developed nanoimprint technology for various applications. With the proper stamps and materials to be imprinted, direct nanoimprint or reversal nanoimprint is achieved by controlling the surface energy of all the surfaces in contact. Multiple layers of nanostructures with the needed designs are stacked together to form three-dimensional (3D) devices with unique features and functions. In this presentation, 3D biosensors will be shown to detect cells and biomolecules with high sensitivity. Nanostructures are used to influence cell migration behaviors. Moreover, metasurfaces will be formed by nanoimprint. These metasurfaces will be incorporated in designs for high-frequency terahertz lenses and antennas, as well as to form chiral magic angles for light manipulation.

Biography: Prof. Yifang Chen, B.Sc (Fudan University), M.Sc (SITP), D.Phil (University of Oxford), received his D.Phil degree in 1995 in Condensed Matter Physics in Oxford. He was a postdoctoral researcher in Delft University of Technology (1994-1996), Nanyang Technological University (1996) and University of Glasgow (1997-2002). He became a senior and then principal scientist in Rutherford Appleton Laboratory (2003-2012), visiting professor in École Polytechnique Fédérale de Lausanne (2010) and visiting senior scientist in National Physical Laboratory, UK (2016-2019). In 2012 he joined Fudan University through national high-end talent plan and received a special government allowance of the State Council in 2018. Dr. Yifang Chen has been dedicated in nanofabrication and applications since 1990, spanning electron beam lithography/nanoimprint lithography/dry-etch for nano-photoelectronic devices and chips, high electron mobility transistors (HEMTs), X-ray micro-optics, metasurface and nanophotonics, etc. Especially in the development of X-ray lenses for X-ray microscopes, he has led his research team achieve successes in manufacturing of key components and has developed a novel Kinoform lens with 15 nm resolution and high efficiency, which enables his research in the world leading position. He has published over 150 SCI papers and awarded 10 national patents in nanotechnology area. He is the associate editor of Microelectronic Engineering (Elsevier) and remote referee of European Research Council (ERC).

Abstract: This talk reviews the technical developments of nanoimprint lithography (NIL) for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures, conducted by the speaker’s group. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T shape gates and functional high electron mobility transistors (HEMTs). The historical work regarding low temperature even room temperature NIL (RTNIL) on HSQ is also addressed, which successfully eliminated the pattern distortion caused by a thermal loop hot imprint process. A big variety of applications by low temperature UV-curing NIL in SU-8 are reviewed for the applications in high aspect ratio phase gratings, tagging technology, nanofluidic channels, nanophotonic metamaterials and biosensors, etc. All these technical developments laid a solid foundation for today’s industrialization applications.

Abstract: As a high-efficiency, low-cost nano-scale technology, nano imprinting lithography has rapidly penetrated into more industries in the past year, such as diffractive optics, MEMS s, AR glasses, 3D sensors, bio-chips, the hardware solutions where is required with nano imprinting lithograph technology.In the past year, nano imprinting lithography has been further improved and steadily improved from materials, processes, equipment and other aspects. Moreover, many materials and equipment from local production have sprang up one after another.As a nano imprinting lithograph equipment manufacturing factory, Suzhou Guyi Nano Tech. Co., Ltd launched nano imprinting equipment and nano imprinting lithograph equipment, which can be widely used in the various scales of  imprinting on the micro-nano structure.

Biography: Professor Lars Montelius has been Director of the International Iberian Nanotechnology Laboratory (INL) in the district of Braga of Portugal since September 1, 2014. He is a professor of nanotechnology at Lund University in Sweden. From 2003 to 2009, he was Head of the Department of Physics, Faculty of Science and Engineering, Lund University. From 2009 to 2011, he was Director of the University of Øresund and the Øresund Science Region, a cross-border collaboration of 11 universities, 3 regional governments and 2 countries in the Øresund region. Professor Lars Montelius chaired the Swedish Technical Committee for Nanotechnology Standardization from 2007 to 2012. He is the founder of several nanotechnology companies in Sweden. He has served as President of the International Union for Vacuum Science, Technique, and Applications (IUVSTA), a member of the decision-making level of the EU NMBP (Nanotechnologies, Advanced Materials, Biotechnology and Advanced Manufacturing and Processing) expert group, and a board member and working group leader of the two major European science and technology platforms, NANOFutures and EuMat. Engaged in nanotechnology for 30 years, Professor Lars Montelius has been working around lithography and processing technologies for a variety of nanodevices. He and his team have published a number of influential papers, especially in the field of nanoimprinting and lithography. Professor Lars Montelius has published more than 170 papers, been invited to give more than 80 lectures, and has applied for 54 patents.

Biography: Gabi Grützner is Founder and CEO of MRT Gmbh & Co KG. Since the company was founded in 1993, MRT has developed into an internationally operating medium-sized company. In doing so, she not only directs the entrepreneurial orientation, but also provides an important innovation impetus for product and technology development. Having completed her study of Chemistry in University of Jena, she is a biochemist focusing on physical and surface chemistry as well as glass chemistry. She then worked as a research assistant for optoelectronic component development at an electronics factory in Berlin and later became an entrepreneur.

Biography: Liu Hongzhong, Distinguished Professor, Doctoral Supervisor of Xi’an Jiaotong University, leading talent of Scientific and Technological Innovation of the "Ten-Thousand Talents Plan" of the Central Organization Department, winner of the National Fund for Distinguished Young Scholars, young and middle-aged leading talent of scientific and technological innovation of the Ministry of Science and Technology, won the first prize of Invention Award 2014 of the Ministry of Education Technology (as the first accomplisher) and the first prize of Shaanxi Provincial Science and Technology Progress Award 2021 (as the first accomplisher). In recent years, focusing on the major needs of the country, he’s concentrated on the research of basic theories and technology applications in intelligent sensing and micro-nano manufacturing, led more than 10 national PR projects, key R&D plans and major special projects, etc. and published more than 140 papers, including more than 100 SCI entries and over 80 authorized invention patents.

Abstract: Originating from nanoimprint process, nanoimprint technology modulated by structured-fields is believed as a novel technology which could replicate multiscale structures from submicron to sub-10nm. In order to meet the requirements of nanoscale features and three-dimensional micro/nano structures as well as multi-materials, nanoimprint technology modulated by structured-fields is developed. Modulated by structured fields, the gradient distributions of multi-materials and their structures could be achieved with nearly zero imprinting force, ensuring the high-fidelity replication. This technology breaks through the limitations of half wavelength effect in traditional lithography, and open up the development of micro/nano device manufacturing with material-structure integration, which could promote the manufacturing of intelligent sensing, micro/nano sensors, generalized chips ,and etc.

Biography:  Dr. Kehan Tian has been long engaged in the latest researches in micro-nano diffractive optical electrical (DOE), 3D optical measuring system and precision manufacturing of semiconductor. He obtained his Bachelor’s degree and Master’s degree from Tsinghua university and then he studied in Massachusetts Institute of Technology (MIT) where he was obtained his Doctor’s degree. After his graduation, he became a Senior Scientist / Researcher (Professor-level) at the TJ Watson Research Center and Semiconductor R&D Center of IBM in the US. He returned to China and started Uphoton Technology, focused on the R&D and commercialization of micro-nano diffractive optical devices and 3D sensors, to provide customized total solutions that are widely applied in smart 3D sensing and recognition, machine vision, AR/VR, smart security and protection system, auto-driving and other fields.

Abstract: Along the development of semiconductor technologies, micro-nano optics has seen wide applications in a variety of fields including consumer electronics, security and protection, car borne devices, etc., in particular AR and 3D. The speech will mainly be talking about the micro-nano optics industrialization research as well as the latest progress in these fields.

Biography:  Dr. Kehan Tian has been long engaged in the latest researches in micro-nano diffractive optical electrical (DOE), 3D optical measuring system and precision manufacturing of semiconductor. He obtained his Bachelor’s degree and Master’s degree from Tsinghua university and then he studied in Massachusetts Institute of Technology (MIT) where he was obtained his Doctor’s degree. After his graduation, he became a Senior Scientist / Researcher (Professor-level) at the TJ Watson Research Center and Semiconductor R&D Center of IBM in the US. He returned to China and started Uphoton Technology, focused on the R&D and commercialization of micro-nano diffractive optical devices and 3D sensors, to provide customized total solutions that are widely applied in smart 3D sensing and recognition, machine vision, AR/VR, smart security and protection system, auto-driving and other fields.

Abstract: Along the development of semiconductor technologies, micro-nano optics has seen wide applications in a variety of fields including consumer electronics, security and protection, car borne devices, etc., in particular AR and 3D. The speech will mainly be talking about the micro-nano optics industrialization research as well as the latest progress in these fields.

Biography:  Dr. Kehan Tian has been long engaged in the latest researches in micro-nano diffractive optical electrical (DOE), 3D optical measuring system and precision manufacturing of semiconductor. He obtained his Bachelor’s degree and Master’s degree from Tsinghua university and then he studied in Massachusetts Institute of Technology (MIT) where he was obtained his Doctor’s degree. After his graduation, he became a Senior Scientist / Researcher (Professor-level) at the TJ Watson Research Center and Semiconductor R&D Center of IBM in the US. He returned to China and started Uphoton Technology, focused on the R&D and commercialization of micro-nano diffractive optical devices and 3D sensors, to provide customized total solutions that are widely applied in smart 3D sensing and recognition, machine vision, AR/VR, smart security and protection system, auto-driving and other fields.

Abstract: Along the development of semiconductor technologies, micro-nano optics has seen wide applications in a variety of fields including consumer electronics, security and protection, car borne devices, etc., in particular AR and 3D. The speech will mainly be talking about the micro-nano optics industrialization research as well as the latest progress in these fields.